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Charge characterisation in metal-gate/high-k layers: Effect of post-deposition annealing and gate electrode
Publication:
Charge characterisation in metal-gate/high-k layers: Effect of post-deposition annealing and gate electrode
Date
2007-07
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
O'Sullivan, Barry
;
Pourtois, Geoffrey
;
Kaushik, Vidya
;
Schram, Tom
;
Kittl, Jorge
;
Pantisano, Luigi
;
De Gendt, Stefan
;
Heyns, Marc
Journal
Applied Physics Letters
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1846
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1846
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations