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Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Publication:
Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Date
1996
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yen, Anthony
;
Tritchkov, Alexander
;
Stirniman, J. P.
;
Vandenberghe, Geert
;
Jonckheere, Rik
;
Ronse, Kurt
;
Van den hove, Luc
Journal
Journal of Vacuum Science and Technology B
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1934
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
1934
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations