Controlling Etch Anisotropy of Crystalline Germanium Nanostructures

dc.contributor.author	Saidov, Khakimjon
dc.contributor.author	Aabdin, Zainul
dc.contributor.author	Yan, Hongwei
dc.contributor.author	Pacco, Antoine
dc.contributor.author	Holsteyns, Frank
dc.contributor.author	Mirsaidov, Utkur
dc.contributor.imecauthor	Pacco, Antoine
dc.contributor.imecauthor	Holsteyns, Frank
dc.contributor.orcidimec	Pacco, Antoine::0000-0001-6330-5053
dc.contributor.orcidimec	Holsteyns, Frank::0009-0002-2123-452X
dc.date.accessioned	2025-09-06T03:58:32Z
dc.date.available	2025-09-06T03:58:32Z
dc.date.issued	2025-AUG 29
dc.description.wosFundingText	This work was supported by Singapore's National Research Foundation (NRF), under the Competitive Research Program (CRP) funding (NRF-CRP23-2019-0001).
dc.identifier.doi	10.1002/smll.202504357
dc.identifier.issn	1613-6810
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/46150
dc.publisher	WILEY-V C H VERLAG GMBH
dc.source.journal	SMALL
dc.source.numberofpages	7
dc.subject.keywords	PERFORMANCE
dc.subject.keywords	SURFACE
dc.subject.keywords	GE
dc.subject.keywords	SI
dc.title	Controlling Etch Anisotropy of Crystalline Germanium Nanostructures
dc.type	Journal article
dspace.entity.type	Publication
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