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Improved metal-insulator-transition characteristics of ultrathin VO2 epitaxial films by optimized surface preparation of rutile TiO2 substrates

Date

2014
Journal article
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dc.contributor.authorMartens, Koen
dc.contributor.authorAetukuri, Nagaphani
dc.contributor.authorJeong, Jaewoo
dc.contributor.authorSamant, Mahesh
dc.contributor.authorParkin, Stuart
dc.contributor.imecauthorMartens, Koen
dc.contributor.orcidimecMartens, Koen::0000-0001-7135-5536
dc.date.accessioned2021-10-22T03:33:31Z
dc.date.available2021-10-22T03:33:31Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24214
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/apl/104/8/10.1063/1.4866037
dc.source.beginpage81918
dc.source.issue8
dc.source.journalApplied Physics Letters
dc.source.volume104
dc.title

Improved metal-insulator-transition characteristics of ultrathin VO2 epitaxial films by optimized surface preparation of rutile TiO2 substrates

dc.typeJournal article
dspace.entity.typePublication
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