Publication:

A new HF vapor native oxide removal process for cluster applications

Date

1998
Proceedings Paper
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dc.contributor.authorSprey, Hessel
dc.contributor.authorStorm, Arjen
dc.contributor.authorMaes, Jan
dc.contributor.authorGranneman, E. H. A.
dc.contributor.authorHendriks, Marton
dc.contributor.authorRöhr, Erika
dc.contributor.authorCaymax, Matty
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.accessioned2021-10-01T09:00:05Z
dc.date.available2021-10-01T09:00:05Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2968
dc.source.beginpageJ1
dc.source.conferenceProceedings of the Symposium on Contamination Free Manufacturing for Semiconductor Manufacturing; SEMICON West
dc.source.conferencedate13/07/1998
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpageJ10
dc.title

A new HF vapor native oxide removal process for cluster applications

dc.typeProceedings paper
dspace.entity.typePublication
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