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Simulating plasma + surface processes for the etching of silicon wtih an Ar/Cl2/O2 inductively coupled plasma
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1845 since deposited on 2021-10-19
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Acq. date: 2026-02-24
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Statistics
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1845 since deposited on 2021-10-19
1last month
1last week
Acq. date: 2026-02-24
Citations