Publication:
O2 post deposition anneal of Al2O3 blocking dielectric for higher performance and reliability of TANOS flash memory
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2089 since deposited on 2021-10-18
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Acq. date: 2026-03-16
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2089 since deposited on 2021-10-18
1last month
1last week
Acq. date: 2026-03-16
Citations