Publication:

O2 post deposition anneal of Al2O3 blocking dielectric for higher performance and reliability of TANOS flash memory

Date

Loading...
Thumbnail Image

Abstract

Description

Metrics

Views

2088 since deposited on 2021-10-18
Acq. date: 2026-01-06

Citations

Metrics

Views

2088 since deposited on 2021-10-18
Acq. date: 2026-01-06

Citations