Publication:
The IMEC-Clean: A new, highly efficient cleaning and drying technique for Si wafers
Date
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.author | Schild, R. | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-09-29T13:07:20Z | |
| dc.date.available | 2021-09-29T13:07:20Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/676 | |
| dc.source.beginpage | 213 | |
| dc.source.endpage | 216 | |
| dc.source.journal | Semiconductor Fabtech | |
| dc.source.volume | 3 | |
| dc.title | The IMEC-Clean: A new, highly efficient cleaning and drying technique for Si wafers | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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