Publication:

Two-step p-MTJ patterning schemes for low density, high yield STT-MRAM devices for embedded applications

Date

2016
Presentation
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dc.contributor.authorRao, Siddharth
dc.contributor.authorSouriau, Laurent
dc.contributor.authorCrotti, Davide
dc.contributor.authorSwerts, Johan
dc.contributor.authorKim, Woojin
dc.contributor.authorKundu, Shreya
dc.contributor.authorDonadio, Gabriele Luca
dc.contributor.authorCouet, Sebastien
dc.contributor.authorFurnemont, Arnaud
dc.contributor.authorKar, Gouri Sankar
dc.contributor.imecauthorRao, Siddharth
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorCrotti, Davide
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorKim, Woojin
dc.contributor.imecauthorKundu, Shreya
dc.contributor.imecauthorDonadio, Gabriele Luca
dc.contributor.imecauthorCouet, Sebastien
dc.contributor.imecauthorFurnemont, Arnaud
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecRao, Siddharth::0000-0001-6161-3052
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecCouet, Sebastien::0000-0001-6436-9593
dc.contributor.orcidimecFurnemont, Arnaud::0000-0002-6378-1030
dc.date.accessioned2021-10-23T14:03:30Z
dc.date.available2021-10-23T14:03:30Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27193
dc.source.conferenceIEDM
dc.source.conferencedate4/12/2016
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Two-step p-MTJ patterning schemes for low density, high yield STT-MRAM devices for embedded applications

dc.typeOral presentation
dspace.entity.typePublication
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