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From Piranha to Barracuda: mechanism of ozone and water vapor photoresistant strip in a wet bench

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dc.contributor.authorRiedel, T.
dc.contributor.authorWolke, K.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorOnsia, Bart
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorOnsia, Bart
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T17:42:07Z
dc.date.available2021-10-14T17:42:07Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5612
dc.source.beginpage227
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS
dc.source.conferencedate18/09/2000
dc.source.conferencelocationOostende Belgium
dc.source.endpage230
dc.title

From Piranha to Barracuda: mechanism of ozone and water vapor photoresistant strip in a wet bench

dc.typeProceedings paper
dspace.entity.typePublication
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