Publication:

Chemical and electrical dopant evolution during solid phase epitaxial regrowth

Date

2003
Proceedings Paper
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dc.contributor.authorPawlak, Bartek
dc.contributor.authorLindsay, Richard
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorKittl, Jorge
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorDuffy, Ray
dc.contributor.authorStolk, P.
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-15T06:04:14Z
dc.date.available2021-10-15T06:04:14Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7990
dc.source.beginpage227
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate28/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
dc.source.endpage233
dc.title

Chemical and electrical dopant evolution during solid phase epitaxial regrowth

dc.typeProceedings paper
dspace.entity.typePublication
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