Publication:

Manufacturing challenges of GaN-on-Si HEMTs in a 200 mm CMOS fab

Date

2013
Journal article
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dc.contributor.authorMarcon, Denis
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorHalder, Sandip
dc.contributor.authorVranckx, Nick
dc.contributor.authorMannaert, Geert
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorDecoutere, Stefaan
dc.contributor.imecauthorMarcon, Denis
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVranckx, Nick
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.accessioned2021-10-21T09:46:58Z
dc.date.available2021-10-21T09:46:58Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn0894-6507
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22759
dc.source.beginpage361
dc.source.endpage367
dc.source.issue3
dc.source.journalIEEE Transactions on Semiconductor Manufacturing
dc.source.volume26
dc.title

Manufacturing challenges of GaN-on-Si HEMTs in a 200 mm CMOS fab

dc.typeJournal article
dspace.entity.typePublication
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