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Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

Date

1998
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dc.contributor.authorKim, Young-Chang
dc.contributor.authorBeckx, Stephan
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-09-30T12:19:39Z
dc.date.available2021-09-30T12:19:39Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2664
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
dc.title

Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning

dc.typeOral presentation
dspace.entity.typePublication
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