Publication:
Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures
Date
| dc.contributor.author | Heyne, Markus | |
| dc.contributor.author | Goodyear, Andy | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Cooke, Mike | |
| dc.contributor.author | Neyts, Erik | |
| dc.contributor.author | Radu, Iuliana | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.contributor.imecauthor | Radu, Iuliana | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | Radu, Iuliana::0000-0002-7230-7218 | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-24T05:43:43Z | |
| dc.date.available | 2021-10-24T05:43:43Z | |
| dc.date.issued | 2017 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28506 | |
| dc.identifier.url | http://www.iplasmanano.org/files/iPlasmaNano_VIII_Programme-LS.pdf?v=4 | |
| dc.source.conference | iPlasmaNano-VIII | |
| dc.source.conferencedate | 2/07/2017 | |
| dc.source.conferencelocation | Antwerp Belgium | |
| dc.title | Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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