Publication:
CoSi2 formation in the presence of interfacial silicon oxide
Date
| dc.contributor.author | Detavernier, C. | |
| dc.contributor.author | Van Meirhaeghe, R. L. | |
| dc.contributor.author | Cardon, F. | |
| dc.contributor.author | Donaton, R. A. | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-10-06T11:04:01Z | |
| dc.date.available | 2021-10-06T11:04:01Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3416 | |
| dc.source.beginpage | 2930 | |
| dc.source.endpage | 32 | |
| dc.source.issue | 20 | |
| dc.source.journal | Appl. Phys. Lett. | |
| dc.source.volume | 74 | |
| dc.title | CoSi2 formation in the presence of interfacial silicon oxide | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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