Early resistance change and stress/electromigration modeling in aluminum interconnects

dc.contributor.author	Petrescu, Violeta
dc.contributor.author	Mouthaan, A. J.
dc.contributor.author	Schoenmaker, Wim
dc.date.accessioned	2021-09-30T09:24:26Z
dc.date.available	2021-09-30T09:24:26Z
dc.date.embargo	9999-12-31
dc.date.issued	1997
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2086
dc.source.beginpage	1491
dc.source.endpage	1494
dc.source.issue	10_11
dc.source.journal	Microelectronics and Reliability
dc.source.volume	37
dc.title	Early resistance change and stress/electromigration modeling in aluminum interconnects
dc.type	Journal article
dspace.entity.type	Publication
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