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Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
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Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
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Date
2008
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12579.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mannaert, Geert
;
Baklanov, Mikhaïl
;
Goossens, Danny
;
Vrancken, Christa
;
Boullart, Werner
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1865
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Acq. date: 2025-12-16
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Views
1865
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-16
Citations