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Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
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1870 since deposited on 2021-10-17
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Acq. date: 2026-08-09
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Statistics
Views
1870 since deposited on 2021-10-17
3last month
3last week
Acq. date: 2026-08-09
Citations