Publication:
Double patterning with dual hard mask for 28nm node devices and below
Date
Loading...
Journal
Abstract
Description
Metrics
Views
1977 since deposited on 2021-10-21
Acq. date: 2025-10-24
Citations
Metrics
Views
1977 since deposited on 2021-10-21
Acq. date: 2025-10-24
Citations