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Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development

Date

2004
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dc.contributor.authorBeckx, Stephan
dc.contributor.authorDemand, Marc
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorHenson, K.
dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorShamiryan, Denis
dc.contributor.authorJaenen, Patrick
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBiesemans, Serge
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorVertommen, Johan
dc.contributor.authorCoenegrachts, Bart
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorCoenegrachts, Bart
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-15T12:41:46Z
dc.date.available2021-10-15T12:41:46Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8552
dc.source.conferenceWorkshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate28/06/2004
dc.source.conferencelocationKinsale Ireland
dc.title

Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development

dc.typeOral presentation
dspace.entity.typePublication
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