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Formation of (Nd,Y)-silicides by sequential channeled implantation of Y and Nd ions

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dc.contributor.authorJin, Sing
dc.contributor.authorBender, Hugo
dc.contributor.authorWu, Ming Fang
dc.contributor.authorVantomme, Andre
dc.contributor.authorLangouche, G.
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVantomme, Andre
dc.date.accessioned2021-10-14T13:07:14Z
dc.date.available2021-10-14T13:07:14Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4457
dc.source.beginpage349
dc.source.endpage354
dc.source.issue3
dc.source.journalNuclear Instruments and Methods B
dc.source.volumeB160
dc.title

Formation of (Nd,Y)-silicides by sequential channeled implantation of Y and Nd ions

dc.typeJournal article
dspace.entity.typePublication
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