Publication:

A detailed study of semiconductor wafer drying

Date

2004
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorFyen, Wim
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorBearda, Twan
dc.contributor.authorArnauts, Sophia
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorDoumen, Geert
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-15T13:29:45Z
dc.date.available2021-10-15T13:29:45Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8933
dc.source.conferenceParticles on Surfaces 8
dc.source.conferencedate16/06/2004
dc.source.conferencelocationPhiladelphia, PA USA
dc.title

A detailed study of semiconductor wafer drying

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations