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The role of argon plasma etching species on ultrathin extreme ultraviolet resists

Date

2025-10
Dissertation
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cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-1188-4924
cris.virtualsource.department89856542-80db-428c-8ba5-3be494ea8b67
cris.virtualsource.orcid89856542-80db-428c-8ba5-3be494ea8b67
dc.contributor.advisorDe Gendt, Stefan
dc.contributor.advisorWitting Larsen, Esben
dc.contributor.advisorPetersen, John
dc.contributor.authorSharma, Arvind
dc.date.accessioned2025-10-28T11:17:10Z
dc.date.available2025-10-28T11:17:10Z
dc.date.issued2025-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/58349
dc.title

The role of argon plasma etching species on ultrathin extreme ultraviolet resists

dc.typePHD thesis
dspace.entity.typePublication
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