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Design and realization of a photolithography alignment and UV exposure equipment for pedagogical and laboratory experiment purposes
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Design and realization of a photolithography alignment and UV exposure equipment for pedagogical and laboratory experiment purposes
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mansano, Ronaldo
;
Ordonez, Nilson
;
Morimoto, Nilton
;
Verdonck, Patrick
;
Carbonne, Bertrand
;
Danto, Yves
;
Bonnaud, Olivier
Journal
Journal sur l'Enseignement des Sciences et Technologies de l'Information et des Systèmes - J3eA
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Views
1832
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-15
Citations