Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

dc.contributor.author	Leray, Philippe
dc.contributor.author	Jehoul, Christiane
dc.contributor.author	Inoue, Osamu
dc.contributor.author	Okagawa, Yutaka
dc.contributor.imecauthor	Leray, Philippe
dc.contributor.imecauthor	Jehoul, Christiane
dc.date.accessioned	2021-10-22T20:25:09Z
dc.date.available	2021-10-22T20:25:09Z
dc.date.issued	2015
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/25527
dc.identifier.url	http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2210946
dc.source.beginpage	942408
dc.source.conference	Metrology, Inspection, and Process Control for Microlithography XXIX
dc.source.conferencedate	22/02/2015
dc.source.conferencelocation	San Jose, CA USA
dc.title	Hybrid overlay metrology with CDSEM in a BEOL patterning scheme
dc.type	Proceedings paper
dspace.entity.type	Publication
Files
Publication available in collections:	Conference contributions

Date