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ALD and parasitic growth characteristics of the tetrakisethylmethylamino hafnium TEMAH/H2O process
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ALD and parasitic growth characteristics of the tetrakisethylmethylamino hafnium TEMAH/H2O process
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Date
2010
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nyns, Laura
;
Delabie, Annelies
;
Swerts, Johan
;
Van Elshocht, Sven
;
De Gendt, Stefan
Journal
Journal of the Electrochemical Society
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1878
since deposited on 2021-10-18
Acq. date: 2026-01-10
Citations
Metrics
Views
1878
since deposited on 2021-10-18
Acq. date: 2026-01-10
Citations