Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

dc.contributor.author	Vandenbroucke, Sofie
dc.contributor.author	Levrau, Elisabeth
dc.contributor.author	Minjauw, Matthias
dc.contributor.author	Van Daele, Michiel
dc.contributor.author	Solano, Eduardo
dc.contributor.author	Vos, Rita
dc.contributor.author	Dendooven, Jolien
dc.contributor.author	Detavernier, Christophe
dc.contributor.imecauthor	Vandenbroucke, Sofie
dc.contributor.imecauthor	Levrau, Elisabeth
dc.contributor.imecauthor	Vos, Rita
dc.contributor.orcidimec	Vandenbroucke, Sofie::0000-0002-2831-3696
dc.date.accessioned	2021-10-29T06:37:50Z
dc.date.available	2021-10-29T06:37:50Z
dc.date.issued	2020
dc.identifier.doi	10.1039/d0cp00395f
dc.identifier.issn	1463-9076
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/36192
dc.source.beginpage	9262
dc.source.endpage	9271
dc.source.issue	17
dc.source.journal	Physical Chemistry Chemical Physics
dc.source.volume	22
dc.title	Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
dc.type	Journal article
dspace.entity.type	Publication
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