Publication:

Selective wet etching of Hf-based layers

Date

2004
Presentation
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dc.contributor.authorSnow, Jim
dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorKraus, Harald
dc.contributor.authorEitoku, Atsuro
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T16:19:40Z
dc.date.available2021-10-15T16:19:40Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9614
dc.source.conferenceSematech Wafer Clean & Surface Prep Conference
dc.source.conferencedate6/05/2004
dc.source.conferencelocationAustin, TX USA
dc.title

Selective wet etching of Hf-based layers

dc.typeOral presentation
dspace.entity.typePublication
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