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In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

Date

2012
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dc.contributor.authorRodriguez, Leonard
dc.contributor.authorDe Clercq, Astrid
dc.contributor.authorTallarida, Massimo
dc.contributor.authorCuypers, Daniel
dc.contributor.authorLocquet, Jean-Pierre
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.accessioned2021-10-20T15:23:27Z
dc.date.available2021-10-20T15:23:27Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21413
dc.source.conferenceAVS 59th International Symposium & Exhibition
dc.source.conferencedate29/10/2012
dc.source.conferencelocationTampa, FL USA
dc.title

In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

dc.typeOral presentation
dspace.entity.typePublication
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