Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch node
Publication:
Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch node
Copy permalink
Date
2010
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
20604.pdf
1.44 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wong, Patrick
;
Gronheid, Roel
;
Wiaux, Vincent
;
Vaglio Pret, Alessandro
;
Verhaegen, Staf
;
Vandenbroeck, Nadia
Journal
Journal of Photopolymer Science and Technology
Abstract
Description
Metrics
Views
1808
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations
Metrics
Views
1808
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations