CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing

dc.contributor.author	Ronse, Kurt
dc.contributor.author	Maenhoudt, Mireille
dc.contributor.author	Marschner, Thomas
dc.contributor.author	Van den hove, Luc
dc.contributor.author	Streefkerk, B.
dc.contributor.author	Finders, Jo
dc.contributor.author	van Schoot, J.
dc.contributor.author	Luehrmann, P.
dc.contributor.author	Minvielle, A.
dc.contributor.imecauthor	Ronse, Kurt
dc.contributor.imecauthor	Van den hove, Luc
dc.contributor.orcidimec	Ronse, Kurt::0000-0003-0803-4267
dc.date.accessioned	2021-10-01T08:49:10Z
dc.date.available	2021-10-01T08:49:10Z
dc.date.embargo	9999-12-31
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2913
dc.source.beginpage	56
dc.source.conference	Optical Microlithography XI
dc.source.conferencedate	25/02/1998
dc.source.conferencelocation	Santa Clara, CA USA
dc.source.endpage	66
dc.title	CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
dc.type	Proceedings paper
dspace.entity.type	Publication
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