Publication:

Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2637772
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dc.contributor.authorAnunciado, Roy
dc.contributor.authorLee, Jisun
dc.contributor.authorBarzegar, Ellaheh
dc.contributor.authorvan der Sanden, Stefan
dc.contributor.authorSchelcher, Guillaume
dc.contributor.authorSchoofs, Stijn
dc.contributor.imecauthorSchelcher, Guillaume
dc.contributor.imecauthorSchoofs, Stijn
dc.contributor.orcidimecSchelcher, Guillaume::0000-0003-3383-1049
dc.date.accessioned2024-04-09T08:59:48Z
dc.date.available2024-04-09T08:59:48Z
dc.date.embargo2022-12-01
dc.date.issued2022
dc.identifier.doi10.1117/12.2637772
dc.identifier.eisbn978-1-5106-5640-6
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43803
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 122920J
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 26-29, 2022
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume12292
dc.title

Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE

dc.typeProceedings paper
dspace.entity.typePublication
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