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AlGaN/GaN based MOSHFETs with different gate dielectrics and treatments

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dc.contributor.authorMistele, D.
dc.contributor.authorRotter, T.
dc.contributor.authorBougrioua, Z.
dc.contributor.authorMoerman, Ingrid
dc.contributor.authorRöver, K.S.
dc.contributor.authorSeyboth, M.
dc.contributor.authorSchwegler, V.
dc.contributor.authorStemmer, J.
dc.contributor.authorFedler, F.
dc.contributor.authorKlausing, H.
dc.contributor.authorSemchinova, O.K.
dc.contributor.authorAderhold, J.
dc.contributor.authorGraul, J.
dc.contributor.imecauthorMoerman, Ingrid
dc.contributor.orcidimecMoerman, Ingrid::0000-0003-2377-3674
dc.date.accessioned2021-10-14T22:26:00Z
dc.date.available2021-10-14T22:26:00Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6612
dc.source.beginpageI6.51
dc.source.conferenceGaN and Related Alloys 2001
dc.source.conferencedate26/11/2002
dc.source.conferencelocationBoston, MA USA
dc.title

AlGaN/GaN based MOSHFETs with different gate dielectrics and treatments

dc.typeProceedings paper
dspace.entity.typePublication
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