Publication:
Hafnium oxide based CMOS compatible ferroelectric materials
Date
| dc.contributor.author | Schroeder, Uwe | |
| dc.contributor.author | Martin, D. | |
| dc.contributor.author | Mueller, J. | |
| dc.contributor.author | Yurchuk, E. | |
| dc.contributor.author | Mueller, S. | |
| dc.contributor.author | Adelmann, Christoph | |
| dc.contributor.author | Schloesser, T. | |
| dc.contributor.author | van Bentum, R. | |
| dc.contributor.author | Mikolajick, Thomas | |
| dc.contributor.imecauthor | Adelmann, Christoph | |
| dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
| dc.date.accessioned | 2021-10-20T15:53:39Z | |
| dc.date.available | 2021-10-20T15:53:39Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21479 | |
| dc.identifier.url | http://ecst.ecsdl.org/content/50/4/15.abstract?sid=ae6626b4-0c76-404e-8927-e76443887628 | |
| dc.source.beginpage | 15 | |
| dc.source.conference | Dielectric Materials and Metals for Nanoelectronics and Photonics 10 | |
| dc.source.conferencedate | 7/10/2012 | |
| dc.source.conferencelocation | Honolulu, HI USA | |
| dc.source.endpage | 20 | |
| dc.title | Hafnium oxide based CMOS compatible ferroelectric materials | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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