Comparison of standard macroscopic and conductive atomic force microscopy leakage measurements on gate removed high-k capacitors

dc.contributor.author	Polspoel, Wouter
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.author	Aguilera, L.
dc.contributor.author	Porti, M.
dc.contributor.author	Nafria, M.
dc.contributor.author	Aymerich, X.
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.date.accessioned	2021-10-18T01:48:57Z
dc.date.available	2021-10-18T01:48:57Z
dc.date.embargo	9999-12-31
dc.date.issued	2009
dc.identifier.issn	1071-1023
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/16036
dc.source.beginpage	356
dc.source.endpage	359
dc.source.issue	1
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	27
dc.title	Comparison of standard macroscopic and conductive atomic force microscopy leakage measurements on gate removed high-k capacitors
dc.type	Journal article
dspace.entity.type	Publication
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