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Managing and controlling contamination in an advanced 8" CMOS pilot line

Date

2001
Proceedings Paper
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dc.contributor.authorDe Backker, Kris
dc.contributor.authorDeweerd, Wim
dc.contributor.authorLebon, Hans
dc.contributor.imecauthorDe Backker, Kris
dc.contributor.imecauthorLebon, Hans
dc.contributor.orcidimecDe Backker, Kris::0000-0002-9123-8908
dc.date.accessioned2021-10-14T16:45:26Z
dc.date.available2021-10-14T16:45:26Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5188
dc.source.beginpage425
dc.source.conferenceProceedings of the IEEE International Symposium on Semiconductor Manufacturing - ISSM
dc.source.conferencedate8/10/2001
dc.source.conferencelocationSan Jose, CA USA
dc.source.endpage428
dc.title

Managing and controlling contamination in an advanced 8" CMOS pilot line

dc.typeProceedings paper
dspace.entity.typePublication
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