Publication:
In-line critical dimension and sidewall roughness metrology study for compound nanostructure process control by in-line 3D atomic force microscopy
Date
| dc.contributor.author | Kim, Tae-Gon | |
| dc.contributor.author | Ryu, Henry | |
| dc.contributor.author | Jo, Ah-jin | |
| dc.contributor.author | Cho, Sang-Joon | |
| dc.contributor.author | Park, Sang-il | |
| dc.contributor.author | Vandeweyer, Tom | |
| dc.contributor.imecauthor | Vandeweyer, Tom | |
| dc.date.accessioned | 2021-10-23T11:48:18Z | |
| dc.date.available | 2021-10-23T11:48:18Z | |
| dc.date.issued | 2016 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/26832 | |
| dc.identifier.url | http://ma.ecsdl.org/content/MA2016-02/30/1950.abstract | |
| dc.source.beginpage | 1950 | |
| dc.source.conference | 230th ECS Meeting: Pacific Rim Meeting - PRiME | |
| dc.source.conferencedate | 2/10/2016 | |
| dc.source.conferencelocation | Honolulu, HI USA | |
| dc.title | In-line critical dimension and sidewall roughness metrology study for compound nanostructure process control by in-line 3D atomic force microscopy | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
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