Band alignment and effective work function of atomiclayer deposited VO2 and V2O5 films on SiO2 and Al2O3

dc.contributor.author	Cerbu, Florin
dc.contributor.author	Chou, H.S.
dc.contributor.author	Radu, Iuliana
dc.contributor.author	Martens, Koen
dc.contributor.author	Peter, Antony
dc.contributor.author	Afanasev, Valeri
dc.contributor.author	Stesmans, Andre
dc.contributor.imecauthor	Cerbu, Florin
dc.contributor.imecauthor	Radu, Iuliana
dc.contributor.imecauthor	Martens, Koen
dc.contributor.imecauthor	Peter, Antony
dc.contributor.imecauthor	Stesmans, Andre
dc.contributor.orcidimec	Radu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimec	Martens, Koen::0000-0001-7135-5536
dc.date.accessioned	2021-10-22T18:38:06Z
dc.date.available	2021-10-22T18:38:06Z
dc.date.issued	2015
dc.identifier.issn	1610-1634
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/25046
dc.identifier.url	http://onlinelibrary.wiley.com/doi/10.1002/pssc.201400037/abstract
dc.source.beginpage	238
dc.source.endpage	241
dc.source.issue	1
dc.source.journal	Physica Status Solidi C
dc.source.volume	12
dc.title	Band alignment and effective work function of atomiclayer deposited VO2 and V2O5 films on SiO2 and Al2O3
dc.type	Journal article
dspace.entity.type	Publication
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