Publication:
One-mask CMOS compatible process for the fabrication of three-dimensional self-assembled thin-film SOI microelectromechanical systems
Date
| dc.contributor.author | Iker, Francois | |
| dc.contributor.author | André, N. | |
| dc.contributor.author | Pardoen, T. | |
| dc.contributor.author | Raskin, J.P. | |
| dc.date.accessioned | 2021-10-16T02:15:49Z | |
| dc.date.available | 2021-10-16T02:15:49Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10633 | |
| dc.source.beginpage | H87 | |
| dc.source.endpage | H89 | |
| dc.source.issue | 10 | |
| dc.source.journal | Electrochemical and Solid State Letters | |
| dc.source.volume | 8 | |
| dc.title | One-mask CMOS compatible process for the fabrication of three-dimensional self-assembled thin-film SOI microelectromechanical systems | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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