Publication:
Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM
Date
| dc.contributor.author | Yamana, Mitsuharu | |
| dc.contributor.author | Lamantia, Matthew | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Wada, Shingo | |
| dc.contributor.author | Nagatomo, Tatsuya | |
| dc.contributor.author | Tonooka, Yoji | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2021-10-18T05:29:06Z | |
| dc.date.available | 2021-10-18T05:29:06Z | |
| dc.date.issued | 2009 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16569 | |
| dc.source.beginpage | 73791L | |
| dc.source.conference | Photomask and Next-Generation Lithography Mask Technology XVI | |
| dc.source.conferencedate | 8/04/2009 | |
| dc.source.conferencelocation | Yokohama Japan | |
| dc.title | Comparison of lithographic performance between MoSi binary mask and MoSi attenuated PSM | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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