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Overbake: sub-40-nm gate patterning with ArF lithography and binary masks
Publication:
Overbake: sub-40-nm gate patterning with ArF lithography and binary masks
Date
2004
Proceedings Paper
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10429.pdf
1.51 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Steenwinckel, David
;
Kwinten, Hans
;
Locorotondo, Sabrina
;
Beckx, Stephan
Journal
Abstract
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1918
since deposited on 2021-10-15
Acq. date: 2025-10-28
Citations
Metrics
Views
1918
since deposited on 2021-10-15
Acq. date: 2025-10-28
Citations