Publication:

Characterization of plasma damage in low-k films by TVS measurements

Date

2009
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorCiofi, Ivan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorCalbo, Giovanni
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.date.accessioned2021-10-17T21:35:39Z
dc.date.available2021-10-17T21:35:39Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15098
dc.source.beginpage1156-D01-08
dc.source.conferenceMaterials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics
dc.source.conferencedate13/04/2009
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Characterization of plasma damage in low-k films by TVS measurements

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions