Publication:

Roughness analysis for (EUV) optical lithography

Date

2010
Presentation
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dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorPoliakov, Pavel
dc.contributor.authorBianche, Davide
dc.contributor.authorGronheid, Roel
dc.contributor.authorBlomme, Pieter
dc.contributor.authorMiranda Corbalan, Miguel
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDehaene, Wim
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDehaene, Wim
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.accessioned2021-10-18T22:40:51Z
dc.date.available2021-10-18T22:40:51Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18130
dc.source.conferencePRODI Workshop
dc.source.conferencedate12/07/2010
dc.source.conferencelocationLeuven Belgium
dc.title

Roughness analysis for (EUV) optical lithography

dc.typeOral presentation
dspace.entity.typePublication
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