Publication:
Patterning capabilities of 40-nm contact holes at 80-nm pitch: EUV vs. Line/Space double exposure immersion lithography
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1924 since deposited on 2021-10-18
4last month
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Acq. date: 2026-08-11
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Statistics
Views
1924 since deposited on 2021-10-18
4last month
1last week
Acq. date: 2026-08-11
Citations