Publication:
Patterning capabilities of 40-nm contact holes at 80-nm pitch: EUV vs. Line/Space double exposure immersion lithography
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1917 since deposited on 2021-10-18
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Acq. date: 2025-12-15
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Views
1917 since deposited on 2021-10-18
1last month
1last week
Acq. date: 2025-12-15
Citations