Publication:

Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051869
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dc.contributor.authorGronheid, Roel
dc.contributor.authorRen, Huan
dc.contributor.authorCheng, Guojie
dc.contributor.authorSah, Kaushik
dc.contributor.authorGao, Xu
dc.contributor.authorTang, Weiwei
dc.contributor.authorChen, Zhijin
dc.contributor.authorZafar, Khurram
dc.contributor.authorGroeger, Philip
dc.contributor.authorBald, Holger
dc.contributor.authorBeaufort, Gaetan De Liedekerke
dc.contributor.authorHabets, Boris
dc.contributor.authorLariviere, Stephane
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorSebaai, Farid
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorSebaai, Farid
dc.contributor.orcidimecLariviere, Stephane::0009-0004-9271-2191
dc.contributor.orcidimecSebaai, Farid::0009-0008-0186-6101
dc.date.accessioned2025-07-31T04:00:02Z
dc.date.available2025-07-31T04:00:02Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051869
dc.identifier.eisbn978-1-5106-8635-9
dc.identifier.isbn978-1-5106-8634-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45988
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on Optical and EUV Nanolithography
dc.source.conferencedateFEB 24-27, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages8
dc.source.volume13424
dc.title

Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography

dc.typeProceedings paper
dspace.entity.typePublication
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