Publication:
Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0009-0004-9271-2191 | |
| cris.virtual.orcid | 0009-0008-0186-6101 | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtualsource.department | 3f0b1410-b038-4b16-9cb9-fbc0af63c742 | |
| cris.virtualsource.department | ceacc897-9287-45a3-a49c-2ae1210a4fd5 | |
| cris.virtualsource.department | 8b2d52c3-6166-486e-97c2-49dee20e1bd1 | |
| cris.virtualsource.orcid | 3f0b1410-b038-4b16-9cb9-fbc0af63c742 | |
| cris.virtualsource.orcid | ceacc897-9287-45a3-a49c-2ae1210a4fd5 | |
| cris.virtualsource.orcid | 8b2d52c3-6166-486e-97c2-49dee20e1bd1 | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | Ren, Huan | |
| dc.contributor.author | Cheng, Guojie | |
| dc.contributor.author | Sah, Kaushik | |
| dc.contributor.author | Gao, Xu | |
| dc.contributor.author | Tang, Weiwei | |
| dc.contributor.author | Chen, Zhijin | |
| dc.contributor.author | Zafar, Khurram | |
| dc.contributor.author | Groeger, Philip | |
| dc.contributor.author | Bald, Holger | |
| dc.contributor.author | Beaufort, Gaetan De Liedekerke | |
| dc.contributor.author | Habets, Boris | |
| dc.contributor.author | Lariviere, Stephane | |
| dc.contributor.author | Baudemprez, Bart | |
| dc.contributor.author | Sebaai, Farid | |
| dc.contributor.imecauthor | Lariviere, Stephane | |
| dc.contributor.imecauthor | Baudemprez, Bart | |
| dc.contributor.imecauthor | Sebaai, Farid | |
| dc.contributor.orcidimec | Lariviere, Stephane::0009-0004-9271-2191 | |
| dc.contributor.orcidimec | Sebaai, Farid::0009-0008-0186-6101 | |
| dc.date.accessioned | 2025-07-31T04:00:02Z | |
| dc.date.available | 2025-07-31T04:00:02Z | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/12.3051869 | |
| dc.identifier.eisbn | 978-1-5106-8635-9 | |
| dc.identifier.isbn | 978-1-5106-8634-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45988 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 1 | |
| dc.source.conference | 2025 Conference on Optical and EUV Nanolithography | |
| dc.source.conferencedate | 2025-04-22 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 8 | |
| dc.title | Influence of Wafer Topography on Focus Control and Defectivity in EUV Lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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