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Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Publication:
Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Date
2012
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Redolfi, Augusto
;
Kubicek, Stefan
;
Rooyackers, Rita
;
Kim, Min-Soo
;
Sleeckx, Erik
;
Devriendt, Katia
;
Shamiryan, Denis
;
Vandeweyer, Tom
;
Delande, Tinne
;
Horiguchi, Naoto
;
Togo, Mitsuhiro
;
Wouters, Johan M. D.
;
Jurczak, Gosia
;
Hoffmann, Thomas Y.
;
Cockburn, Andrew
;
Gravey, Virginie
;
Diehl, D.L.
Journal
Solid-State Electronics
Abstract
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2033
since deposited on 2021-10-20
Acq. date: 2025-10-22
Citations
Metrics
Views
2033
since deposited on 2021-10-20
Acq. date: 2025-10-22
Citations