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MOCVD of SBT from fluorine containing precursor system: microstructure optimization and fluorine elimination

Date

2004
Presentation
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dc.contributor.authorCondorelli, G.G.
dc.contributor.authorAnastasi, G.
dc.contributor.authorBedoya, C.
dc.contributor.authorFavazza, M.
dc.contributor.authorBaeri, A.
dc.contributor.authorLo Nigro, R.
dc.contributor.authorMenou, N.
dc.contributor.authorMuller, Ch.
dc.contributor.authorLisoni, Judit
dc.contributor.authorWouters, Dirk
dc.contributor.authorFragala, I.L.
dc.date.accessioned2021-10-15T12:56:17Z
dc.date.available2021-10-15T12:56:17Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8717
dc.source.conferenceEuropean Material Research Society Spring Meeting Symposium D: Functional Oxides for Advanced Semiconductor Technologies
dc.source.conferencedate24/05/2004
dc.source.conferencelocationStrasbourg France
dc.title

MOCVD of SBT from fluorine containing precursor system: microstructure optimization and fluorine elimination

dc.typeOral presentation
dspace.entity.typePublication
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