Publication:

UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning

Date

1994
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLi, Li
dc.contributor.authorAlay, Josep Lluis
dc.contributor.authorMertens, Paul
dc.contributor.authorMeuris, Marc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.contributor.authorDe Blank, Rene
dc.contributor.authorSchuivens, Eugene
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorDe Blank, Rene
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T12:43:04Z
dc.date.available2021-09-29T12:43:04Z
dc.date.embargo9999-12-31
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/229
dc.source.beginpage163
dc.source.conferenceProceedings 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate19/09/1994
dc.source.conferencelocationBrugge Belgium
dc.source.endpage166
dc.title

UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
221.pdf
Size:
108.48 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions