Publication:

Plasma modification of Si-O-Si bond structure in porous SiOCH films

Date

2008
Proceedings Paper
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dc.contributor.authorDultsev, F.N.
dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T06:58:04Z
dc.date.available2021-10-17T06:58:04Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13681
dc.source.beginpageN7.3-03
dc.source.conferenceMaterials and Processes for Advanced Interconnects for Microelectronics
dc.source.conferencedate24/03/2008
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Plasma modification of Si-O-Si bond structure in porous SiOCH films

dc.typeProceedings paper
dspace.entity.typePublication
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