In-device high resolution and high throughput optical metrology for process development and monitoring

dc.contributor.author	Sah, Kaushik
dc.contributor.author	Li, Shifang
dc.contributor.author	Das, Sayantan
dc.contributor.author	Halder, Sandip
dc.contributor.author	Cross, Andrew
dc.contributor.imecauthor	Das, Sayantan
dc.contributor.imecauthor	Halder, Sandip
dc.contributor.imecauthor	Sah, Kaushik
dc.contributor.orcidimec	Das, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimec	Halder, Sandip::0000-0002-6314-2685
dc.date.accessioned	2022-01-13T10:55:13Z
dc.date.available	2021-11-02T16:02:23Z
dc.date.available	2022-01-13T10:55:13Z
dc.date.issued	2020
dc.identifier.eisbn	978-1-7281-5876-1
dc.identifier.issn	1078-8743
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/37981
dc.publisher	IEEE
dc.source.conference	31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
dc.source.conferencedate	AUG 24-26, 2020
dc.source.conferencelocation	Saratoga Springs
dc.source.journal	na
dc.source.numberofpages	5
dc.title	In-device high resolution and high throughput optical metrology for process development and monitoring
dc.type	Proceedings paper
dspace.entity.type	Publication
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