Publication:

NA/sigma optimisation strategies for an advanced DUV stepper applied to 0.25 mm and sub-0.25 mm critical levels

Date

1997
Proceedings Paper
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dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorGhandehari, Kouros
dc.contributor.authorJaenen, Patrick
dc.contributor.authorBotermans, Harry
dc.contributor.authorFinders, Jo
dc.contributor.authorLilygren, John
dc.contributor.authorBaker, Daniel
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.accessioned2021-09-30T09:23:51Z
dc.date.available2021-09-30T09:23:51Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2081
dc.source.beginpage320
dc.source.conferenceOptical Microlithography X
dc.source.conferencedate12/03/1997
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage332
dc.title

NA/sigma optimisation strategies for an advanced DUV stepper applied to 0.25 mm and sub-0.25 mm critical levels

dc.typeProceedings paper
dspace.entity.typePublication
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